| 发明名称 |
System for overlay measurement in semiconductor manufacturing |
| 摘要 |
Provided is a system for overlay measurement in semiconductor manufacturing that includes a generator for exposing an overlay target to radiation and a detector for detecting reflected beams of the overlay target. The reflected beams are for overlay measurement and include at least two different beams. |
| 申请公布号 |
US8119992(B2) |
申请公布日期 |
2012.02.21 |
| 申请号 |
US20090537410 |
申请日期 |
2009.08.07 |
| 申请人 |
LU HSIAO-TZU;LIN CHIN-HSIANG;WU HUA-SHU;LIN CHIA-HSIANG;CHEN KUEI SHUN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LU HSIAO-TZU;LIN CHIN-HSIANG;WU HUA-SHU;LIN CHIA-HSIANG;CHEN KUEI SHUN |
| 分类号 |
G01J1/42;H01L21/76;H01L23/544 |
主分类号 |
G01J1/42 |
| 代理机构 |
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