| 摘要 |
PURPOSE: A susceptor and a chemical vapor deposition apparatus including the same are provided to prevent deformation of a substrate support part due to friction with a pin, thereby stably performing a deposition process. CONSTITUTION: A reaction chamber(10) provides a space for a chemical reaction. The reaction chamber comprises a gateway, a reacting gas supply part(12), and an exhaust pipe(13). A heat insulation material is arranged on the inner circumferential surface of the reaction chamber for heat resistance. A susceptor(20) comprises a main body(21) and a substrate support part(22). A heating source(30) supplies heat inside of the reaction chamber.
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