| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology which can restrain installation areas for a processing block while restraining reduction of utilization efficiency of a device. <P>SOLUTION: Unit blocks for prestage processing are duplicated and laminated one above the other as a first unit block for prestage processing and a second unit block for prestage processing, and unit blocks for subsequent-stage processing are duplicated and laminated one above the other as a first unit block for subsequent-stage processing and a second unit block for subsequent-stage processing, and also unit blocks for development processing are duplicated and laminated one above the other as a first unit block for development processing and a second unit block for development processing to configure processing blocks. The coating and development device is configured to comprise a first delivery mechanism to sort and deliver a substrate to each unit block for a subsequent-stage processing from the unit blocks for prestage processing and a second delivery mechanism to sort and deliver the substrate after exposure to the unit blocks for development processing. <P>COPYRIGHT: (C)2012,JPO&INPIT |
