发明名称 |
APPARATUS FOR PREVENTING PARTICLES FROM BEING INDUCED TO OPENER OF WAFER TRANSFER RECEPTACLE |
摘要 |
PURPOSE: An apparatus for preventing particles from being induced to an opener of a wafer transfer receptacle is provided to prevent the particles from remaining in a fine gap temporarily generated in a process for opening the wafer transfer receptacle. CONSTITUTION: A frame(110) of the wafer transfer receptacle(200) is installed in the inlet of process equipment(300) having different cleanliness. A particle exhaust unit is buried in a predetermined position of the frame to exhaust the particles of a space part generated when the wafer transfer receptacle is closely adhered to the frame.
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申请公布号 |
KR20020011763(A) |
申请公布日期 |
2002.02.09 |
申请号 |
KR20000045281 |
申请日期 |
2000.08.04 |
申请人 |
SHIN SUNG ENG CO., LTD. |
发明人 |
KIM, YONG PYO;LEE, WAN GEUN |
分类号 |
H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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