发明名称 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a new photoacid generator (PAG) compound, and to provide a photoresist composition containing the PAG compound. <P>SOLUTION: This invention relates to new ionic photoacid generator compounds that comprise a nitrogen-based functional component of the structure -C(=O)N< such as lactam, amide and imide. Preferred photoacid generators are salts where the anion component comprises a moiety of the structure -C(-O)N< such as a lactam, amide and imide. The photoresist composition contains the one or more PAG. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012031134(A) 申请公布日期 2012.02.16
申请号 JP20110098236 申请日期 2011.04.26
申请人 ROHM & HAAS ELECTRONIC MATERIALS LLC 发明人 BAE YOUNG CHEOL;CARDOLACCIA THOMAS;LIU YI
分类号 C07D207/27;C09K3/00;G03F7/004;G03F7/039 主分类号 C07D207/27
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