发明名称 |
PHOTOACID GENERATOR AND PHOTORESIST COMPRISING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new photoacid generator (PAG) compound, and to provide a photoresist composition containing the PAG compound. <P>SOLUTION: This invention relates to new ionic photoacid generator compounds that comprise a nitrogen-based functional component of the structure -C(=O)N< such as lactam, amide and imide. Preferred photoacid generators are salts where the anion component comprises a moiety of the structure -C(-O)N< such as a lactam, amide and imide. The photoresist composition contains the one or more PAG. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012031134(A) |
申请公布日期 |
2012.02.16 |
申请号 |
JP20110098236 |
申请日期 |
2011.04.26 |
申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
BAE YOUNG CHEOL;CARDOLACCIA THOMAS;LIU YI |
分类号 |
C07D207/27;C09K3/00;G03F7/004;G03F7/039 |
主分类号 |
C07D207/27 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|