TRANSPARENT REFLECTOR PLATE FOR RAPID THERMAL PROCESSING CHAMBER
摘要
The present invention generally relates to methods and apparatus for processing substrates. Embodiments of the invention include apparatuses for processing a substrate comprising a ceramic reflector plate, which may be optically transparent. The reflector plate may include a reflective coating and be part of a reflector plate assembly in which the reflector plate is assembled to a baseplate.
申请公布号
WO2012021464(A2)
申请公布日期
2012.02.16
申请号
WO2011US46987
申请日期
2011.08.09
申请人
APPLIED MATERIALS, INC.;KOELMEL, BLAKE R.;HUNTER, AARON M.;LERNER, ALEXANDER N.
发明人
KOELMEL, BLAKE R.;HUNTER, AARON M.;LERNER, ALEXANDER N.