发明名称 TRANSPARENT REFLECTOR PLATE FOR RAPID THERMAL PROCESSING CHAMBER
摘要 The present invention generally relates to methods and apparatus for processing substrates. Embodiments of the invention include apparatuses for processing a substrate comprising a ceramic reflector plate, which may be optically transparent. The reflector plate may include a reflective coating and be part of a reflector plate assembly in which the reflector plate is assembled to a baseplate.
申请公布号 WO2012021464(A2) 申请公布日期 2012.02.16
申请号 WO2011US46987 申请日期 2011.08.09
申请人 APPLIED MATERIALS, INC.;KOELMEL, BLAKE R.;HUNTER, AARON M.;LERNER, ALEXANDER N. 发明人 KOELMEL, BLAKE R.;HUNTER, AARON M.;LERNER, ALEXANDER N.
分类号 H01L21/324 主分类号 H01L21/324
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