| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymerizable monomer for use in a resist, suitable for microfabrication performed by dry exposure, immersion exposure or a double patterning process, and to provide a polymer of the same, a resist material using the same, and a pattern formation method. <P>SOLUTION: This polymerizable monomer contains a repeating unit represented by general formula (6), general formula (7), or general formula (8). (In the formula, R<SP POS="POST">1</SP>represents a hydrogen atom, a halogen atom, a methyl group, or a trifluoromethyl group; R<SP POS="POST">2</SP>represents a methyl group, an ethyl group, or an isopropyl group; and A represents a carbonyl group (C=O) together with a carbon atom bonded thereto, or an acetal structure in which the carbonyl group is protected by a protective group). <P>COPYRIGHT: (C)2012,JPO&INPIT |
