发明名称 METHOD FOR MANUFACTURING PIEZOELECTRIC THIN FILM ELEMENT, PIEZOELECTRIC THIN FILM ELEMENT, AND MEMBER FOR PIEZOELECTRIC THIN FILM ELEMENT
摘要 <p>The invention provides a method for manufacturing a piezoelectric thin film element having a piezoelectric thin film layer demonstrating excellent surface morphology and exceptional crystallinity. The method comprises the steps of: forming a lower electrode layer (2) on a substrate (1); forming a piezoelectric thin film buffer layer (3) on the lower electrode layer (2) at a relatively low deposition temperature; forming a piezoelectric thin film layer (4) on the piezoelectric thin film buffer layer (3) at a deposition temperature higher than the deposition temperature of the piezoelectric thin film buffer layer (3); and forming an upper electrode layer on the piezoelectric thin film layer (4).</p>
申请公布号 WO2012020638(A1) 申请公布日期 2012.02.16
申请号 WO2011JP66896 申请日期 2011.07.26
申请人 MURATA MANUFACTURING CO., LTD.;IKEUCHI, SHINSUKE;YAMAMOTO, KANSHO 发明人 IKEUCHI, SHINSUKE;YAMAMOTO, KANSHO
分类号 C01G33/00;C01G45/02;C04B35/00;C23C14/06;H01L41/08;H01L41/09;H01L41/18;H01L41/316;H01L41/319 主分类号 C01G33/00
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