发明名称 |
METHOD FOR MANUFACTURING PIEZOELECTRIC THIN FILM ELEMENT, PIEZOELECTRIC THIN FILM ELEMENT, AND MEMBER FOR PIEZOELECTRIC THIN FILM ELEMENT |
摘要 |
<p>The invention provides a method for manufacturing a piezoelectric thin film element having a piezoelectric thin film layer demonstrating excellent surface morphology and exceptional crystallinity. The method comprises the steps of: forming a lower electrode layer (2) on a substrate (1); forming a piezoelectric thin film buffer layer (3) on the lower electrode layer (2) at a relatively low deposition temperature; forming a piezoelectric thin film layer (4) on the piezoelectric thin film buffer layer (3) at a deposition temperature higher than the deposition temperature of the piezoelectric thin film buffer layer (3); and forming an upper electrode layer on the piezoelectric thin film layer (4).</p> |
申请公布号 |
WO2012020638(A1) |
申请公布日期 |
2012.02.16 |
申请号 |
WO2011JP66896 |
申请日期 |
2011.07.26 |
申请人 |
MURATA MANUFACTURING CO., LTD.;IKEUCHI, SHINSUKE;YAMAMOTO, KANSHO |
发明人 |
IKEUCHI, SHINSUKE;YAMAMOTO, KANSHO |
分类号 |
C01G33/00;C01G45/02;C04B35/00;C23C14/06;H01L41/08;H01L41/09;H01L41/18;H01L41/316;H01L41/319 |
主分类号 |
C01G33/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|