| 摘要 |
<P>PROBLEM TO BE SOLVED: To correct imaging characteristics of a projection optical system. <P>SOLUTION: Illumination light IL via a first reticle R1 is radiated via a first optical system PL1 to a second reticle R2 that is reflective, and the illumination light IL via the second reticle R2 is radiated via a second optical system PL2 to a wafer W. Then, according to the position of the first reticle R1, the reflective surface of the second reticle R2 within an irradiation region IA R2 is slightly deformed and/or the second reticle R2 is driven relatively to the irradiation region IA R2 (illumination light IL). As a result, the surface shape of the reflective surface of the second reticle R2 within the irradiation region IA R2 is changed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
