发明名称 MASS FLOW CONTROLLER, MASS FLOW CONTROLLER SYSTEM, SUBSTRATE PROCESSING APPARATUS AND GAS FLOW RATE ADJUSTMENT METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a mass flow controller capable of changing a gas flow rate more quickly than conventional ones. <P>SOLUTION: According to the embodiment, a mass flow controller 100 includes a gas passage composing member 110, a flow rate adjustment part 130, a displacement magnitude storage part 144 and a setting circuit 145. The flow rate adjustment 130 has a valve 131 arranged in a gas passage 113 for adjusting a gas flow rate and an actuator 133 for controlling the displacement magnitude of the valve 131. The displacement magnitude storage part 144 stores information of the displacement magnitudes of the valve 131 calculated for every processing procedure before performing any processing procedure, which shows its displacement magnitude when allowing gas of a flow rate regulated by the processing procedure to flow into the gas passage 113. The setting circuit 145 obtains the displacement magnitude corresponding to the processing procedure from the displacement magnitude storage part 144 to control the actuator 133 based on the displacement magnitude obtained. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012033150(A) 申请公布日期 2012.02.16
申请号 JP20110122390 申请日期 2011.05.31
申请人 TOSHIBA CORP 发明人 ETO HIDEO;SAITO MAKOTO;NISHIYAMA NOBUYASU
分类号 G05D7/06;H01L21/3065 主分类号 G05D7/06
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