| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus capable of preventing electrodeposition from occurring during a substrate cleaning process and observing the substrate status. <P>SOLUTION: A substrate cleaning apparatus comprises: a cleaning part for cleaning a substrate 12 on which a power generation layer is formed; a carrying-in part that is provided on the upstream side of the cleaning part and carries the substrate 12 from a substrate carrying-in port to the cleaning part; a drying part for drying a power generation layer of the cleaned substrate 12; a carrying-out part that is provided on the downstream side of the drying part and carries the dried substrate 12 to a substrate carrying-out port; light shielding means 9 for shielding light falling on the carrying-in part except for the substrate carrying-in port, the cleaning part, the drying part, and the carrying-out part except for the substrate carrying-out port; an observation window 10 provided in the light shielding means; and light transmission means for shielding at least a part of wavelengths that contribute to generation of the power generation layer among lights falling from the observation window 10 and setting the power generation voltage of the power generation layer to 1/10 or below of the power generation voltage when at least a part of the wavelengths is not shielded. <P>COPYRIGHT: (C)2012,JPO&INPIT |
