发明名称 IRRADIATION OPTICAL SYSTEM, IRRADIATION APPARATUS AND FABRICATION METHOD FOR SEMICONDUCTOR DEVICE
摘要 An irradiation optical system including: a first projection optical system for mixing a plurality of luminous fluxes outputted from a laser light source having a plurality of linearly arrayed light emitting points with each other and dividing the mixed luminous fluxes into a plurality of luminous fluxes and then projecting, to a slit member having a plurality of slits parallel to each other, the plural luminous fluxes as a line beam extending across the plural slits; and a second projection optical system for projecting an image of the plural slits of the slit member to an irradiation target.
申请公布号 US2012038983(A1) 申请公布日期 2012.02.16
申请号 US201113280602 申请日期 2011.10.25
申请人 TSUKIHARA KOICHI;SONY CORPORATION 发明人 TSUKIHARA KOICHI
分类号 G02B5/30 主分类号 G02B5/30
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