| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor and its system that can support high integration and high-speed by means of monitoring fluctuations due to process variations in a system LSI or the like. SOLUTION: A laser 23 is irradiated on a substrate 1 where a pattern or a film is formed, and variations among chips of reflected light levels fluctuating by fluctuation of process conditions is obtained in a chip group within a wafer, and this fluctuation is monitored within the wafer or among wafers, and thus control over the process conditions in a semiconductor manufacturing can be achieved.
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