| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve a reflective optical element for use in EUV lithography to meet the need for EUV lithography. <P>SOLUTION: The high-reflectivity hardened silica-titania article consists of a silica-titania glass substrate having at least one radiation-hardened surface, and a selected multilayer reflection coating on the hardened surface. The multilayer reflection coating is a metal silicide multilayer coating, and the silica-titania glass consists of 3-12 mass% of titania, and 88-97 mass% of silica. The reflection coating consists of 30-60 coating periods where each period has one metal layer and one silicon layer. The metal layer is preferably the first layer on the top face of the radiation-hardened surface of the substrate. Preferably, the metal layers and silicon layers have a thickness in the range of about 2-5 nm, respectively. <P>COPYRIGHT: (C)2012,JPO&INPIT |
