发明名称 |
Inverse Mask Design and Correction for Electronic Design |
摘要 |
Various implementations of the invention provide for the generation of “smooth” mask contours by inverse mask transmission derivation and by subsequently “smoothing” the derived mask contours by proximity correction. |
申请公布号 |
US2012042291(A1) |
申请公布日期 |
2012.02.16 |
申请号 |
US201113283523 |
申请日期 |
2011.10.27 |
申请人 |
GRANIK YURI;SAKAJIRI KYOHEI |
发明人 |
GRANIK YURI;SAKAJIRI KYOHEI |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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