发明名称 CHARGED PARTICLE BEAM DRAWING APPARATUS AND METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a charged particle beam drawing apparatus and method improving drawing accuracy at a joining part of shots when drawing multiple layers. <P>SOLUTION: A charged particle beam drawing apparatus 100 includes: a storage part 106 for receiving an input of layout data with plural defined figures and storing the data; a data processing part 140 for converting the layout data to generate plural pieces of shot data for the number of multiple drawing times constituting shots of charged particle beam as units; and a drawing part 102 for sequentially irradiating a sample with the charged particle beams using the plural pieces of shot data to draw multiple drawings. Further, the data processing part 140 generates the shot data so as to not mutually overlap shot borders generated in drawings when the plural pieces of shot data are overlapped one another. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012033697(A) 申请公布日期 2012.02.16
申请号 JP20100171798 申请日期 2010.07.30
申请人 NUFLARE TECHNOLOGY INC 发明人 ANPO AKIHITO
分类号 H01L21/027 主分类号 H01L21/027
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