发明名称 METHOD FOR GROWING CRYSTAL AND SEMICONDUCTOR ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for growing crystal which can control development of dislocation and cracks, and warpage of a substrate. <P>SOLUTION: The method for growing crystals of the group III nitride semiconductor includes steps of: heating a silicon substrate 100; and forming a concave structure 105 on a surface of the heated silicon substrate 100 by advance-feeding a gas containing at least TMA (trimethylaluminum). <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012031047(A) 申请公布日期 2012.02.16
申请号 JP20110042479 申请日期 2011.02.28
申请人 RITSUMEIKAN;SHARP CORP 发明人 AOYANAGI KATSUNOBU;TAKEUCHI MICHIICHI;UEDA YOSHIHIRO;OTA MASATAKA
分类号 C30B29/38;C23C16/34;C30B25/18;H01L21/205;H01L33/32 主分类号 C30B29/38
代理机构 代理人
主权项
地址