发明名称 |
METHOD FOR GROWING CRYSTAL AND SEMICONDUCTOR ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for growing crystal which can control development of dislocation and cracks, and warpage of a substrate. <P>SOLUTION: The method for growing crystals of the group III nitride semiconductor includes steps of: heating a silicon substrate 100; and forming a concave structure 105 on a surface of the heated silicon substrate 100 by advance-feeding a gas containing at least TMA (trimethylaluminum). <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012031047(A) |
申请公布日期 |
2012.02.16 |
申请号 |
JP20110042479 |
申请日期 |
2011.02.28 |
申请人 |
RITSUMEIKAN;SHARP CORP |
发明人 |
AOYANAGI KATSUNOBU;TAKEUCHI MICHIICHI;UEDA YOSHIHIRO;OTA MASATAKA |
分类号 |
C30B29/38;C23C16/34;C30B25/18;H01L21/205;H01L33/32 |
主分类号 |
C30B29/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|