发明名称 METHOD FOR MANUFACTURING OPTICAL MEMBER AND MASK MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a processed base material having excellent antireflection ability. <P>SOLUTION: A method for manufacturing an optical member according to the present invention includes: (1) a step of applying a photocurable composition (A) containing a polymerizable monomer (Ax) having an aromatic group and/or an alicyclic hydrocarbon group on a base material or a mold having a fine pattern; (2) a step of irradiating the photocurable composition (A) with light while the photocurable composition (A) is sandwiched between the base material and the mold, thereby curing the photocurable composition (A); (3) a step of releasing the mold to form the fine pattern on the base material; and (4) a step of processing the base material by etching using the obtained fine pattern as a mask. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012033550(A) 申请公布日期 2012.02.16
申请号 JP20100169421 申请日期 2010.07.28
申请人 FUJIFILM CORP 发明人 KODAMA KUNIHIKO
分类号 H01L21/027 主分类号 H01L21/027
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