| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photopolymerizable resin composition for use in transferring a microstructure, which allows a thinner and uniform thin film to be formed, transfer accuracy of an extremely smaller microfine pattern to be excellent, and the curing time of the thin film to be shortened. <P>SOLUTION: When making a microstructure 5 using steps shown in (a) to (f), the photopolymerizable resin composition 1 includes a component (A), a component (B), a component (C), a component (D) and a component (E) at following rates: (A) a 6-15 functional acrylate, in 0.5-10 mass%; (B) an acrylate with a weight-average molecular weight (Mw) of 1,000-10,000, in 0.5-10 mass%; (C) an acrylate having a benzene ring, in 0.5-10 mass%; (D) a reactive diluent, in 80-98 mass%; and (E) a photopolymerization initiator, in 0.1-5 mass%. <P>COPYRIGHT: (C)2012,JPO&INPIT |
