发明名称 |
MINUTE STRUCTURE, MICROMACHINE, ORGANIC TRANSISTOR, ELECTRIC APPLIANCE, AND MANUFACTURING METHOD THEREOF |
摘要 |
A micromachine is generally formed using a semiconductor substrate such as a silicon wafer. One of the objects of the present invention is to realize further reduction in cost by integrating a minute structure and a semiconductor element controlling the minute structure over one insulating surface in one step. A minute structure has a structure in which a first layer formed into a frame-shape are provided over an insulating surface, a space is formed inside the frame, and a second layer is formed to cross over the first layer. Such a minute structure and a thin film transistor can be integrated over one insulating surface in one step.
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申请公布号 |
US2012037966(A1) |
申请公布日期 |
2012.02.16 |
申请号 |
US201113283648 |
申请日期 |
2011.10.28 |
申请人 |
YAMAGUCHI MAYUMI;IZUMI KONAMI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAGUCHI MAYUMI;IZUMI KONAMI |
分类号 |
H01L29/78;H01L21/302 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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