发明名称 MINUTE STRUCTURE, MICROMACHINE, ORGANIC TRANSISTOR, ELECTRIC APPLIANCE, AND MANUFACTURING METHOD THEREOF
摘要 A micromachine is generally formed using a semiconductor substrate such as a silicon wafer. One of the objects of the present invention is to realize further reduction in cost by integrating a minute structure and a semiconductor element controlling the minute structure over one insulating surface in one step. A minute structure has a structure in which a first layer formed into a frame-shape are provided over an insulating surface, a space is formed inside the frame, and a second layer is formed to cross over the first layer. Such a minute structure and a thin film transistor can be integrated over one insulating surface in one step.
申请公布号 US2012037966(A1) 申请公布日期 2012.02.16
申请号 US201113283648 申请日期 2011.10.28
申请人 YAMAGUCHI MAYUMI;IZUMI KONAMI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAGUCHI MAYUMI;IZUMI KONAMI
分类号 H01L29/78;H01L21/302 主分类号 H01L29/78
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