| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an in-line film deposition system reducing energy consumption for evacuating a heating chamber in a stopped state of a film deposition operation without reducing deposition efficiency. <P>SOLUTION: The film deposition system 1 includes a transfer chamber 2, 5 for introducing in and/or leading out a substrate, the heating chamber 3 for heating the introduced substrate, and a deposition treatment chamber 4 for depositing a film on the substrate, the treatment chambers being arranged in series and the substrate being sequentially transferred to each chamber to perform the film deposition operation, wherein the transfer chamber, the heating chamber, and the deposition treatment chamber are equipped with an evacuation mechanism separately evacuating each chamber. The evacuation mechanism provided to the heating chamber is continuously actuated in a running state of the film deposition operation of the film deposition system, and intermittently actuated in the stopped state of the film deposition operation. By intermittently actuating the evacuation mechanism in the stopped state of the film deposition operation, the energy consumption for evacuating the heating chamber can be reduced compared with the case of constantly actuating the evacuation mechanism. <P>COPYRIGHT: (C)2012,JPO&INPIT |
