发明名称 |
Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers |
摘要 |
A Vacuum transport chamber for disk-shaped substrates, has a base plate structure has an interior surface which borders an interior of the chamber on one side thereof. A covering structure is situated parallel and opposite an interior surface of the base plate structure. The structure has at least two substrate passage openings which are adapted to a substrate disk surface. A transport device which is rotationally drivingly movable about a rotation axis perpendicular to the base plate structure. At least one substrate receiving device is brought into alignment with a respective one of the openings. A controlled sealing arrangement establishes an edge of at least one of the openings with the substrate holding device brought into alignment therewith and a substrate provided thereon.
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申请公布号 |
US7033471(B2) |
申请公布日期 |
2006.04.25 |
申请号 |
US20040919273 |
申请日期 |
2004.08.17 |
申请人 |
UNAXIS BALZERS AKTIENGESELLSCHAFT |
发明人 |
DUBS MARTIN;SCHERTLER ROMAN |
分类号 |
C23C16/00;C23C14/22;C23C14/35;C23C14/56;G11B7/26 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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