发明名称 Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
摘要 A Vacuum transport chamber for disk-shaped substrates, has a base plate structure has an interior surface which borders an interior of the chamber on one side thereof. A covering structure is situated parallel and opposite an interior surface of the base plate structure. The structure has at least two substrate passage openings which are adapted to a substrate disk surface. A transport device which is rotationally drivingly movable about a rotation axis perpendicular to the base plate structure. At least one substrate receiving device is brought into alignment with a respective one of the openings. A controlled sealing arrangement establishes an edge of at least one of the openings with the substrate holding device brought into alignment therewith and a substrate provided thereon.
申请公布号 US7033471(B2) 申请公布日期 2006.04.25
申请号 US20040919273 申请日期 2004.08.17
申请人 UNAXIS BALZERS AKTIENGESELLSCHAFT 发明人 DUBS MARTIN;SCHERTLER ROMAN
分类号 C23C16/00;C23C14/22;C23C14/35;C23C14/56;G11B7/26 主分类号 C23C16/00
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