SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD OF THE SAME

摘要

PURPOSE: A substrate processing apparatus and a substrate processing apparatus control method are provided to secure a redundancy space inside of a housing by changing the built-in position of a lead opening apparatus, thereby reducing the whole size of the substrate processing apparatus. CONSTITUTION: A chamber(200) comprises a reaction space. A lead(300) selectively opens or closes the reaction space. A lift operation apparatus(500) supplies driving force for transferring the lead in up and down directions. A power transmission device(600) connects the lift operation apparatus and the lead. The power transmission device transfers the lead in up and down directions.