| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor apparatus in which oxidation of fine particles functioning as quantum dot object is suppressed surely. SOLUTION: The semiconductor apparatus 20 comprises a semiconductor substrate 1, a tunnel insulating film 3 provided on the semiconductor substrate 1, fine particles 4 of an oxide semiconductor having nonincreasing oxidation number arranged at an interval on the tunnel insulating film 3, an insulating film 5 of SiO<SB>2</SB>provided on the tunnel insulating film 3 to bury the fine particles 4, and a control gate 6 provided on the insulating film 5. Since the fine particles 4 functioning as quantum dots are not oxidized during or after fabrication process to become an insulator, the semiconductor apparatus is fabricated with good yield while enhancing the reliability. COPYRIGHT: (C)2007,JPO&INPIT |
