发明名称 |
TECHNIQUES FOR PROCESSING A SUBSTRATE |
摘要 |
<p>Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be achieved using a mask for processing the substrate. The mask may be incorporated into a substrate processing system such as, for example, an ion implantation system. The mask may comprise one or more first apertures disposed in a first row; and one or more second apertures disposed in a second row, each row extending along a width direction of the mask, wherein the one or more first apertures and the one or more second apertures are non-uniform.</p> |
申请公布号 |
EP2417623(A2) |
申请公布日期 |
2012.02.15 |
申请号 |
EP20100762439 |
申请日期 |
2010.04.08 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES |
发明人 |
DANIELS, KEVIN, M.;LOW, RUSSELL, J.;RIORDON, BENJAMIN, B.;BATEMAN, NICHOLAS, P., T. |
分类号 |
H01L21/266;H01J37/317;H01L31/18 |
主分类号 |
H01L21/266 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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