POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR FORMING RESIST PATTERN,申请号KR20067018950-传众专利搜索

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发明名称	POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR FORMING RESIST PATTERN
摘要
申请公布号	KR100801046(B1)	申请公布日期	2008.02.04
申请号	KR20067018950	申请日期	2006.09.15
申请人		发明人
分类号	G03F7/039;C08F220/10;G03F7/004;G03F7/027;H01L21/027	主分类号	G03F7/039
代理机构		代理人
主权项
地址

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