发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source. |
申请公布号 |
US8115900(B2) |
申请公布日期 |
2012.02.14 |
申请号 |
US20070898933 |
申请日期 |
2007.09.17 |
申请人 |
VAN DE VIJVER YURI JOHANNES GABRIEL;VAN SCHOOT JAN BERNARD PLECHELMUS;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;SCHIMMEL HENDRIKUS GIJSBERTUS;LABETSKI DZMITRY;VAN EMPEL TJARKO ADRIAAN RUDOLF;ASML NETHERLANDS B.V. |
发明人 |
VAN DE VIJVER YURI JOHANNES GABRIEL;VAN SCHOOT JAN BERNARD PLECHELMUS;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;SCHIMMEL HENDRIKUS GIJSBERTUS;LABETSKI DZMITRY;VAN EMPEL TJARKO ADRIAAN RUDOLF |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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