发明名称 Wiring substrate and manufacturing method thereof, and semiconductor apparatus
摘要 In a semiconductor apparatus, a semiconductor element is mounted on a wiring substrate. Wiring patterns and protrusions are formed on a surface of a substrate with the wiring patterns extending on tops of the protrusions. The surface of the substrate on which the wiring patterns are formed are covered with an insulating layer. Surfaces of connection parts of the wiring patterns formed on the tops of the protrusions are formed with the surfaces of the connection parts exposed to a surface of the insulating layer on a level with the surface of the insulating layer or in a position lower than the surface of the insulating layer. The connection parts are formed as pads for connection formed in alignment with connection electrodes of the semiconductor element. The semiconductor element is mounted by making electrical connection to the connection parts by flip chip bonding.
申请公布号 US8115300(B2) 申请公布日期 2012.02.14
申请号 US20070763053 申请日期 2007.06.14
申请人 MURAMATSU SHIGETSUGU;KOBAYASHI TSUYOSHI;KURIHARA TAKASHI;SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 MURAMATSU SHIGETSUGU;KOBAYASHI TSUYOSHI;KURIHARA TAKASHI
分类号 H01L23/12 主分类号 H01L23/12
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