发明名称 |
Gas field ion source, charged particle microscope, and apparatus |
摘要 |
A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature. |
申请公布号 |
US8115184(B2) |
申请公布日期 |
2012.02.14 |
申请号 |
US20080318583 |
申请日期 |
2008.12.31 |
申请人 |
SHICHI HIROYASU;MATSUBARA SHINICHI;OHSHIMA TAKASHI;TOMIMATSU SATOSHI;HASHIZUME TOMIHIRO;ISHITANI TOHRU;HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
SHICHI HIROYASU;MATSUBARA SHINICHI;OHSHIMA TAKASHI;TOMIMATSU SATOSHI;HASHIZUME TOMIHIRO;ISHITANI TOHRU |
分类号 |
H01J49/00 |
主分类号 |
H01J49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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