发明名称 FINE PROCESSING METHOD AND FINE PROCESSING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To achieve stabilization in the quality of a substrate having a fine uneven pattern on its surface and further achieving the thickness reduction and miniaturization of the substrate. SOLUTION: A tabular article to be processed having a smooth resin surface provided on at least one side thereof is used. During a die operation process wherein a die for punching the article to be processed into a predetermined shape is moved from an initial position to be returned to the initial position through a punching position, at least one of a transfer member having an uneven pattern formed on its surface and the article to be processed is raised in temperature by heating and, in this state, the uneven pattern of the transfer member is pressed to the resin surface of the article to be processed to perform a transfer process for transferring the uneven pattern to a place positioned with respect to a predetermined punching shape. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008094078(A) 申请公布日期 2008.04.24
申请号 JP20070141020 申请日期 2007.05.28
申请人 SEIKOH GIKEN CO LTD 发明人 SAKAMOTO YASUYOSHI
分类号 B29C59/02 主分类号 B29C59/02
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