发明名称 |
ANTI-SCATTER GRID AND MANUFACTURING METHOD THEREOF |
摘要 |
<p>PURPOSE: An anti-scatter grid and a manufacturing method thereof are provided to easily form a silicon frame of a plurality of vertical partition walls by using a crystalline wet etch process of silicon and an ultraviolet exposure process. CONSTITUTION: An anti-scatter grid(10) includes a vertical partition wall which is parallelly arranged in a vertical crystal face of a crystalline substrate. A silicon frame(11) includes a base common body part which connects a plurality of vertical partition walls. A X-ray absorber metal(20) is formed on the silicon frame. A scattering X-ray(32) generated by an subject(40) is dampened with the X-ray absorber metal of the vertical partition walls. A X-ray(33) arrives in a X-ray detector(50) passing through a transmitting material(25). The X-ray absorber metal is composed of nickel, copper, gold, and aluminum etc.</p> |
申请公布号 |
KR20120012736(A) |
申请公布日期 |
2012.02.10 |
申请号 |
KR20100075063 |
申请日期 |
2010.08.03 |
申请人 |
GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
JEONG, DAE HUN;LEE, JONG HYUN |
分类号 |
A61B6/10;H01L21/027 |
主分类号 |
A61B6/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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