发明名称 POLYMER ON THE BASE OF POLY(FERROCENYL)SYLANE, METHOD OF ITS PRODUCTION AND THE FILM INCLUDING THE POLYMER THE BASE OF POLY(FERROCENYL)SYLANE
摘要 FIELD: semi-conductors. ^ SUBSTANCE: invention refers to polymers on the base of poly(ferrocenyl)sylane used in photon semiconductor matrixes. The invention proposes celled polymer on the base of poly(ferrocenyl)sylane including repeating blocks with three types of structures, way of its manufacturing based on spatial crossing of basic polymer and binding agent and the film including the substrate and connected to it celled polymer on the base of poly(ferrocenyl)sylane. ^ EFFECT: proposed celled polymers have 3D structures and are produced using technological method that does not require special multistage cleaning of precursors. ^ 12 cl, 1 dwg, 1 ex
申请公布号 RU2441874(C1) 申请公布日期 2012.02.10
申请号 RU20100125697 申请日期 2010.06.23
申请人 KORPORATSIJA "SAMSUNG EHLEKTRONIKS KO., LTD.";UCHREZHDENIE ROSSIJSKOJ AKADEMII NAUK INSTITUT FIZIKI TVERDOGO TELA RAN 发明人 MUN GU KHAN;EMEL'CHENKO GENNADIJ ANATOL'EVICH;USTYNJUK NIKOLAJ ALEKSANDROVICH;PEGANOVA TAT'JANA ANATOL'EVNA;KAL'SIN ALEKSANDR MIKHAJLOVICH
分类号 C07F7/08;C07F17/02;C08G77/50 主分类号 C07F7/08
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