| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid application technology for a liquid material application device which accurately applies a trace amount of a liquid, the technology being suitable for, in particular, applying a liquid in an application quantity of ≤1 pL by a dispenser system. <P>SOLUTION: A liquid application device is constituted in such a manner that the inside diameter of the tip of a dispenser nozzle is made small and the pressures of gas in contact with two interfaces formed by the liquid in the nozzle are made equal to each other, thereby the liquid position at the nozzle tip is stabilized, and highly accurately controlled pulsed pressure is applied to the liquid inside the nozzle from a nozzle rear end while the liquid position at the nozzle tip is stabilized to thereby apply the liquid inside the nozzle onto a material to be coated and further the nozzle is moved upward at an adequate timing after application. <P>COPYRIGHT: (C)2012,JPO&INPIT |
