RESIN MOLD FOR NANOIMPRINTING

摘要

This resin mold for nanoimprinting has a resin layer formed with fine irregularities on the surface, wherein the resin layer is formed from 1 to 49 parts by weight of a silicone-based macromonomer and/or a fluorine-based macromonomer, and 99 to 51 parts by weight of at least one polymerizable monomer selected from the group comprising a (metha)acryl-based monomer, a styrene-based monomer, an epoxy-based monomer, olefin-based monomer and a polycarbonate-based resin-forming monomer. The molecular weight of the silicone-based macromonomer and/or the fluorine-based macromonomer is within a range of 600 to 10000, and the macromonomer has a reactive group capable of polymerization with the polymerizable monomer on the ends of the molecules. When the reactive group copolymerizes with the polymerizable group, the silicone-based unit or the fluorine-based unit forming the macromonomer forms a side chain with respect to a trunk polymer that is formed from the polymerizable monomer and the macromonomer.