发明名称 |
EXPOSURE DEVICE FOR EDGE OF SUBSTRATE |
摘要 |
<p>An exposure apparatus for edge of a substrate is provided to expose both edge parts of the substrate easily by forming two linear light source regions with one lamp. A chamber(100) includes a reflective plate(120) for reflecting light of a lamp(110). A cooling chamber maintains constant temperature by suppressing a temperature increase due to the lamp and the reflective plate. A pair of first reflective mirrors(310a,310b) are installed on the left side of the cooling chamber in order to reflect the light of the reflective plate to both sides thereof. A pair of second reflective mirrors(320a,320b) are formed to reflect the light of the first reflective mirrors to the lower side. A pair of lenses(330a,330b) are formed to condense the light of the second reflective mirrors. A light source control unit(350) is installed on the lower side of the lenses in order to control the condensed light region and to irradiate the light to edge of a substrate. The lamp is a linear lamp having a shape of bar installed in a longitudinal direction.</p> |
申请公布号 |
KR100847520(B1) |
申请公布日期 |
2008.07.22 |
申请号 |
KR20070026691 |
申请日期 |
2007.03.19 |
申请人 |
OPTO FINETECH CO., LTD.;KIM, JAI SOON |
发明人 |
KANG, HEUNG SEOK;LEE, KYUNG KYU;KIM, JAI SOON |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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