发明名称 EXPOSURE DEVICE FOR EDGE OF SUBSTRATE
摘要 <p>An exposure apparatus for edge of a substrate is provided to expose both edge parts of the substrate easily by forming two linear light source regions with one lamp. A chamber(100) includes a reflective plate(120) for reflecting light of a lamp(110). A cooling chamber maintains constant temperature by suppressing a temperature increase due to the lamp and the reflective plate. A pair of first reflective mirrors(310a,310b) are installed on the left side of the cooling chamber in order to reflect the light of the reflective plate to both sides thereof. A pair of second reflective mirrors(320a,320b) are formed to reflect the light of the first reflective mirrors to the lower side. A pair of lenses(330a,330b) are formed to condense the light of the second reflective mirrors. A light source control unit(350) is installed on the lower side of the lenses in order to control the condensed light region and to irradiate the light to edge of a substrate. The lamp is a linear lamp having a shape of bar installed in a longitudinal direction.</p>
申请公布号 KR100847520(B1) 申请公布日期 2008.07.22
申请号 KR20070026691 申请日期 2007.03.19
申请人 OPTO FINETECH CO., LTD.;KIM, JAI SOON 发明人 KANG, HEUNG SEOK;LEE, KYUNG KYU;KIM, JAI SOON
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址
您可能感兴趣的专利