发明名称 Silicon Single Crystal Production Method
摘要 Silicon single crystals having suppressed deformation and dislocations and the successful omission of the tail section are produced by growing the straight-body section of the silicon single crystal under the influence of a horizontal magnetic field with a magnetic flux density at its magnetic center being ≧1000 Gauss, and ≦̸2000 Gauss, reducing the lifting speed of the silicon single crystal relative to the surface of the melt to 0 mm/minute, maintaining a static state until there is a decrease in the apparent weight of the silicon single crystal, then further maintaining the static state so that the entire growth front of the silicon single crystal forms a convex shape protruding in a direction opposite to the lifting direction of the silicon single crystal, and separating the silicon single crystal from the melt.
申请公布号 US2012031323(A1) 申请公布日期 2012.02.09
申请号 US201113189645 申请日期 2011.07.25
申请人 KYUFU SHINICHI;SILTRONIC AG 发明人 KYUFU SHINICHI
分类号 C30B15/22 主分类号 C30B15/22
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