| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a metal complex which has a low melting point, excels in heat stability, and is suitable for film-formation by the CVD method and a method for producing a metal-containing thin film using the metal complex. <P>SOLUTION: The metal complex has a β-diketonate ligand represented by formula (1) [wherein X is a dialkylalkoxymethyl group represented by formula (2) (wherein R<SP POS="POST">a</SP>, R<SP POS="POST">b</SP>and R<SP POS="POST">c</SP>are each a 1-5C linear or branched alkyl group); Y is a group represented by formula (2) or a 1-8C linear or branched alkyl group; and Z is hydrogen or a 1-4C linear or branched alkyl group]. <P>COPYRIGHT: (C)2012,JPO&INPIT |
