| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device in which a mask can be initially arranged so as not to be inclined to a substrate transfer direction, in a continuous exposure system for small masks that exposes using small masks arranged in a direction perpendicular to the substrate transfer direction while continuously transferring substrates. <P>SOLUTION: On a transfer stage 2, an alignment mark 8 is provided as a reference in adjusting an initial position of a photomask 4. A driving mechanism 6 that holds the photomask 4 within an exposure head 3 not only moves the photomask 4 in parallel but also rotates the photomask 4 to adjust its inclination to a transfer direction (y axis). In adjusting the initial position of the photomask 4, a positional relationship between the alignment mark 8 and a pattern on the photomask 4 is determined from an image captured by an imaging device 7, and an inclination of the photomask 4 is adjusted by the driving mechanism 6 so that each line in an image forming pattern on the photomask 4 is aligned in a direction perpendicular to the transfer direction based on a position of the alignment mark 8. <P>COPYRIGHT: (C)2012,JPO&INPIT |
