发明名称 |
CLEANING METHOD, CLEANING DEVICE, DEVICE MANUFACTURING METHOD, PROGRAM AND RECORDING MEDIUM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning method which can successfully clean members and the like contacting an exposure liquid. <P>SOLUTION: The cleaning method of the present invention is the method of cleaning an immersion member disposed in an immersion exposure device in which a substrate is exposed to an exposure light via an exposure liquid. The immersion member is disposed on at least a part of a region around an optical path of the exposure light passing through optical members and through an exposure liquid between the optical members and the substrate. The cleaning method includes the steps of carrying a cleaning tool into the immersion exposure device to dispose the cleaning tool at a position facing a first recovery port of the immersion member for recovering the exposure liquid, and supplying a cleaning liquid to a recovery passage of the immersion member through which the exposure liquid from the first recovery port flows. The immersion member has a first discharge port for discharging the exposure liquid from the recovery passage and a second discharge port for discharging gases from the recovery passage, through which discharge of the exposure liquid is more highly inhibited than the first discharge port. The cleaning liquid is recovered from a recovery part of the cleaning tool via the first recovery port. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012028777(A) |
申请公布日期 |
2012.02.09 |
申请号 |
JP20110159998 |
申请日期 |
2011.07.21 |
申请人 |
NIKON CORP |
发明人 |
TANAKA AKIRA;IKEDA YUTAKA |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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