| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified negative resist composition that has a good sensitivity to i-line and that is capable of forming a surface protective film, an interlayer insulating film and a flattening film excellent in various characteristics such as resolution, electric insulating property and thermal shock property. <P>SOLUTION: A chemically amplified negative photoresist composition comprises: a component (E) comprising a photoacid generator containing [4-(4-biphenylthio)phenyl]-4-biphenylylphenyl sulfonium salt, where each phenyl group may have a substituent selected from an alkyl group, a hydroxyl group and an alkoxy group; a component (F) which is an alkali-soluble resin having a phenolic hydroxyl group; and a crosslinking agent component (G). <P>COPYRIGHT: (C)2012,JPO&INPIT |
