发明名称 |
METHOD FOR INSPECTING EUV RETICLE AND APPARATUS THEREOF |
摘要 |
A method of inspecting an EUV reticle is proposed, which uses an electron beam (EB) with low density and high energy to scan the surface of an EUV reticle for inspecting the EUV reticle. A step of conditioning surface charge is followed by a step of inspecting surface of the EUV reticle. The step of conditioning surface can neutralize the surface charge and the step of inspecting can obtain an image of the EUV reticle. The present invention uses a scanning electron microscope (SEM) to provide a primary electron beam for conditioning the surface charge and a focused primary electron beam for scanning the surface. |
申请公布号 |
US2012032076(A1) |
申请公布日期 |
2012.02.09 |
申请号 |
US20100850899 |
申请日期 |
2010.08.05 |
申请人 |
KUAN CHIYAN;FANG WEI;WANG YOU-JIN;HERMES MICROVISION, INC. |
发明人 |
KUAN CHIYAN;FANG WEI;WANG YOU-JIN |
分类号 |
G01N23/00;G21K7/00 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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