| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a storage case for a synthetic quartz glass substrate for a photo mask and a photo mask blank in which out gas component is hardly generated which may be absorbed on a substrate by using a case formed by bonding of a synthetic resin member. <P>SOLUTION: A manufacturing method for a storage case for a synthetic quartz glass substrate for a photo mask or a photo mask blank includes a step of preparation of a case formed by bonding of a synthetic resin member, a step in which an absorption member in which active carbon is dispersed into gelatinous medium is arranged in the case and set for a certain period of time, a step in which the absorption member is taken out from the case, and a step in which the case from which the absorption member is taken out is cleansed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
