| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ion supply device that can obtain uniform static elimination effect in a wide range, and a processing system for workpiece equipped with the same. <P>SOLUTION: The ion supply device 54 includes an ion supply nozzle 58 which blows ions and carrier gas to an object of static elimination from which static electricity is removed. The ion supply nozzle 58 is provided with a slit 59 at its blowoff hole. The slit 59 is formed to increase in width as a distance from the object of static elimination increases. An internal flow passage 60 in the vicinity of the blowoff hole of the ion supply nozzle 58 is provided with a plurality of internal fins 61. The internal fins 61 are arranged such that the ions and carrier gas blown from the slit 59 are dispersed uniformly over the lengthwise area of the slit 59. <P>COPYRIGHT: (C)2012,JPO&INPIT |
