| 摘要 |
With respect to an exposure device wherein a microlens array and a mask are anchored at a prescribed distance from one another, provided is a microlens exposure device that facilitates easy and highly precise adjustment of a gap, between the microlens array and a substrate for exposure, to the focal positions of microlenses. A laser beam for exposure is projected on a photoresist film (2) by microlenses (3a) of a microlens array (3). Light from a microscope (10) passes through holes (5b) of a Cr film (5) of a mask (4), penetrates the microlenses (3b), and is projected on the photoresist film (2). By observing with the microscope (10) whether the light that penetrates the microlenses (3b) is focused on the photoresist film (2), it is possible to determine the focal point of the exposure light that is made to converge on the photoresist film (2) by the microlenses (3a). |
