发明名称 |
SELF-PASSIVATING MECHANICALLY STABLE HERMETIC THIN FILM |
摘要 |
<p>A hermetic thin film includes a first inorganic layer and a second inorganic layer contiguous with the first inorganic layer, wherein the second inorganic layer is formed as a reaction product of the first inorganic layer with oxygen and has a molar volume that is about -1% to 15% greater than a molar volume of the first inorganic layer. An equilibrium thickness of the second inorganic layer is at least 10% of but less than an as-deposited thickness of the first inorganic layer.</p> |
申请公布号 |
WO2012018487(A1) |
申请公布日期 |
2012.02.09 |
申请号 |
WO2011US43772 |
申请日期 |
2011.07.13 |
申请人 |
CORNING INCORPORATED;AN, CHONG PYUNG;QUESADA, MARK, A |
发明人 |
AN, CHONG PYUNG;QUESADA, MARK, A |
分类号 |
C23C14/08;C03C3/247;C23C14/58;H01L51/52 |
主分类号 |
C23C14/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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