发明名称 |
CONTROLLING AN EPITAXIAL GROWTH PROCESS IN AN EPITAXIAL REACTOR |
摘要 |
A system for controlling an epitaxial growth process in an epitaxial reactor. The system includes a processor for setting up a modeled output parameter value as a linear function of the actual output parameter value and a second set of thermocouple offset parameter values. The processor also determines a distance between a target output parameter value and the modeled output parameter value |
申请公布号 |
US2012035768(A1) |
申请公布日期 |
2012.02.09 |
申请号 |
US201113278723 |
申请日期 |
2011.10.21 |
申请人 |
SCHIEKOFER MANFRED;FOGLIETTI PIETRO;MAIER ROBERT;TEXAS INSTRUMENTS INCORPORATED |
发明人 |
SCHIEKOFER MANFRED;FOGLIETTI PIETRO;MAIER ROBERT |
分类号 |
G05B21/02;G05D23/19 |
主分类号 |
G05B21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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