发明名称 |
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTURING DEVICES USING THE SYSTEM |
摘要 |
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers. |
申请公布号 |
US2012032079(A1) |
申请公布日期 |
2012.02.09 |
申请号 |
US201113243429 |
申请日期 |
2011.09.23 |
申请人 |
NAKASUJI MAMORU;NOJI NOBUHARU;SATAKE TOHRU;HATAKEYAMA MASAHIRO;KIMBA TOSHIFUMI;SOBUKAWA HIROSI;YOSHIKAWA SHOJI;MURAKAMI TAKESHI;WATANABE KENJI;KARIMATA TSUTOMU;OOWADA SHIN;SAITO MUTSUMI;YAMAZAKI YUICHIRO;NAGAI TAKAMITSU;NAGAHAMA ICHIROTA;KABUSHIKI KAISHA TOSHIBA;EBARA CORPORATION |
发明人 |
NAKASUJI MAMORU;NOJI NOBUHARU;SATAKE TOHRU;HATAKEYAMA MASAHIRO;KIMBA TOSHIFUMI;SOBUKAWA HIROSI;YOSHIKAWA SHOJI;MURAKAMI TAKESHI;WATANABE KENJI;KARIMATA TSUTOMU;OOWADA SHIN;SAITO MUTSUMI;YAMAZAKI YUICHIRO;NAGAI TAKAMITSU;NAGAHAMA ICHIROTA |
分类号 |
H01J37/26;G01N23/225;H01J3/26;H01J37/06;H01J37/073;H01J37/18;H01J37/20;H01J37/22;H01J37/244;H01J37/28 |
主分类号 |
H01J37/26 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|