| 摘要 |
A chemical vapor deposition device includes a chamber, a gas input assembly, a gas output assembly, a heating device, and a driving module. The chamber includes a first side, a second side and a deposition area defined between the first side and the second side. The second side is opposite to the first side. The gas input assembly is positioned at the first side of the chamber. The gas input assembly includes a jet module. The jet module faces the deposition area to introduce reaction gases. The gas output assembly is positioned at the second side of the chamber. The gas output assembly exhausts the gases in the chamber. The heating device heats the deposition area. The driving module drives a deposition roll located in the deposition area.
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