发明名称 |
Method of producing nanostructures in membrances, and asymmetrical membrane |
摘要 |
A process for preparation of nano structures in membranes where a polymer membrane is irradiated with charged particles, especially ions, to give particle traces, which etch the membrane under the action of an etching fluid, and the etching action is stopped by use of a stopping liquid, as a result of which an asymmetrical structure is produced, the polymer material being polyimide is new. An Independent claim is included for a membrane with asymmetrical pores consisting of polyimide and obtained as above. |
申请公布号 |
PL200439(B1) |
申请公布日期 |
2009.01.30 |
申请号 |
PL20030358849 |
申请日期 |
2003.02.24 |
申请人 |
GESELLSCHAFT FUER SCHWERIONENFORSCHUNG MBH |
发明人 |
SIWY ZUZANNA;DOBREV DOBRI D.;NEUMANN REINHARD;TRAUTMANN CHRISTINA;VOSS KAI-OBBE |
分类号 |
B01D67/00;B01D69/02;B01D71/64 |
主分类号 |
B01D67/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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