| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an illumination system for microlithographic projection exposure apparatus. <P>SOLUTION: An illumination system for a microlithographic projection exposure apparatus comprises a light source (30) and an optical integrator (56). The optical integrator possesses first optical elements (561X, 561Y, 562X, 562Y) and produces a plurality of secondary light sources (82) each emitting a light beam. A light condenser (62) enables the beam to superpose in mask surface (70). At least one of dispersion structures (58, 60) comprises a plurality of independently designed second optical elements disposed in front of or back of the second light source. The first and second optical elements are configured to enable the optical elements irradiated by same irradiance distribution to be spaced above 5 mm. <P>COPYRIGHT: (C)2012,JPO&INPIT |
